![Negative-tone molecular glass photoresist for high-resolution electron beam lithography | Royal Society Open Science Negative-tone molecular glass photoresist for high-resolution electron beam lithography | Royal Society Open Science](https://royalsocietypublishing.org/cms/asset/ca9cba62-1a42-4cd7-9f01-ec6be8b8df8d/rsos202132f05.gif)
Negative-tone molecular glass photoresist for high-resolution electron beam lithography | Royal Society Open Science
![Architecture of Chiral Poly(phenylacetylene)s: From Compressed/Highly Dynamic to Stretched/Quasi-Static Helices | Journal of the American Chemical Society Architecture of Chiral Poly(phenylacetylene)s: From Compressed/Highly Dynamic to Stretched/Quasi-Static Helices | Journal of the American Chemical Society](https://pubs.acs.org/cms/10.1021/jacs.6b04834/asset/images/medium/ja-2016-04834c_0011.gif)
Architecture of Chiral Poly(phenylacetylene)s: From Compressed/Highly Dynamic to Stretched/Quasi-Static Helices | Journal of the American Chemical Society
![Architecture of Chiral Poly(phenylacetylene)s: From Compressed/Highly Dynamic to Stretched/Quasi-Static Helices | Journal of the American Chemical Society Architecture of Chiral Poly(phenylacetylene)s: From Compressed/Highly Dynamic to Stretched/Quasi-Static Helices | Journal of the American Chemical Society](https://pubs.acs.org/cms/10.1021/jacs.6b04834/asset/images/medium/ja-2016-04834c_0004.gif)
Architecture of Chiral Poly(phenylacetylene)s: From Compressed/Highly Dynamic to Stretched/Quasi-Static Helices | Journal of the American Chemical Society
![Polímeros: Ciência e Tecnologia (Polimeros) 2nd. issue, vol. 33, 2023 by Polímeros: Ciência e Tecnologia (Polimeros) - Issuu Polímeros: Ciência e Tecnologia (Polimeros) 2nd. issue, vol. 33, 2023 by Polímeros: Ciência e Tecnologia (Polimeros) - Issuu](https://image.isu.pub/230905123020-f9e2ed1fdeb4b82ee3efdc99e486bb4d/jpg/page_1.jpg)
Polímeros: Ciência e Tecnologia (Polimeros) 2nd. issue, vol. 33, 2023 by Polímeros: Ciência e Tecnologia (Polimeros) - Issuu
![Negative-tone molecular glass photoresist for high-resolution electron beam lithography | Royal Society Open Science Negative-tone molecular glass photoresist for high-resolution electron beam lithography | Royal Society Open Science](https://royalsocietypublishing.org/cms/asset/ca505ef4-1b3c-4459-a669-215d1319ca22/rsos202132f06.gif)
Negative-tone molecular glass photoresist for high-resolution electron beam lithography | Royal Society Open Science
![Sequence-Defined Synthetic Polymers for New-Generation Functional Biomaterials | ACS Materials Letters Sequence-Defined Synthetic Polymers for New-Generation Functional Biomaterials | ACS Materials Letters](https://pubs.acs.org/cms/10.1021/acsmaterialslett.1c00358/asset/images/large/tz1c00358_0009.jpeg)
Sequence-Defined Synthetic Polymers for New-Generation Functional Biomaterials | ACS Materials Letters
PcrA Helicase Tightly Couples ATP Hydrolysis to Unwinding Double-Stranded DNA, Modulated by the Initiator Protein for Plasmid Replication, RepD | Biochemistry
Solution-Processable Indenofluorenes on Polymer Brush Interlayer: Remarkable N-Channel Field-Effect Transistor Characteristics under Ambient Conditions | ACS Applied Materials & Interfaces
![Solution-Processable Indenofluorenes on Polymer Brush Interlayer: Remarkable N-Channel Field-Effect Transistor Characteristics under Ambient Conditions | ACS Applied Materials & Interfaces Solution-Processable Indenofluorenes on Polymer Brush Interlayer: Remarkable N-Channel Field-Effect Transistor Characteristics under Ambient Conditions | ACS Applied Materials & Interfaces](https://pubs.acs.org/cms/10.1021/acsami.3c07365/asset/images/large/am3c07365_0008.jpeg)